Title Graphene-Assisted Epitaxy of Nitrogen Lattice Polarity GaN Films on Non-Polar Sapphire Substrates for Green Light Emitting Diodes
Authors Liu, Fang
Zhang, Zhihong
Rong, Xin
Yu, Ye
Wang, Tao
Sheng, Bowen
Wei, Jiaqi
Zhou, Siyuan
Yang, Xuelin
Xu, Fujun
Qin, Zhixin
Zhang, Yuantao
Liu, Kaihui
Shen, Bo
Wang, Xinqiang
Affiliation Peking Univ, Sch Phys, State Key Lab Mesoscop Phys, Beijing 100871, Peoples R China
Peking Univ, Sch Phys, Frontiers Sci Ctr Nanooptoelect, Beijing 100871, Peoples R China
Jilin Univ, Coll Elect Sci & Engn, State Key Lab Integrated Optoelect, Changchun 130012, Peoples R China
Peking Univ, Sch Phys, Electron Microscopy Lab, Beijing 00871, Peoples R China
Collaborat Innovat Ctr Quantum Matter, Beijing 100871, Peoples R China
Keywords GROWTH
LAYER
Issue Date Mar-2020
Publisher ADVANCED FUNCTIONAL MATERIALS
Abstract Lattice polarity is a key point for hexagonal semiconductors such as GaN. Unfortunately, only Ga-polarity GaN have been achieved on graphene till now. Here, the epitaxy of high quality nitrogen-polarity GaN films on transferred graphene on non-polar sapphire substrates by molecular beam epitaxy is reported. This success is achieved through atomic nitrogen irradiation, where C-N bonds are formed in graphene and provide nucleation sites for GaN and leading to N-polarity GaN epitaxy. The N-polarity characteristics are confirmed by chemical etching and transmission electron microscopy measurement. Due to the higher growth temperature of InGaN at N-polarity than that at Ga-polarity, green light emitting diodes are fabricated on the graphene-assisted substrate, where a large redshift of emission wavelength is observed. These results open a new avenue for the polarity modulation of III-nitride films based on 2D materials, and also pave the way for potential application in longer wavelength light emitting devices.
URI http://hdl.handle.net/20.500.11897/606567
ISSN 1616-301X
DOI 10.1002/adfm.202001283
Indexed SCI(E)
Scopus
EI
Appears in Collections: 物理学院
人工微结构和介观物理国家重点实验室

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