Title Growth mechanism and atomic structure of group-IIA compound-promoted CVD-synthesized monolayer transition metal dichalcogenides
Authors Li, Shouheng
Wang, Shanshan
Xu, Tao
Zhang, Hui
Tang, Yuxiang
Liu, Song
Jiang, Tian
Zhou, Shen
Cheng, Haifeng
Affiliation Natl Univ Def Technol, Coll Aerosp Sci & Engn, Sci & Technol Adv Ceram Fibers & Composites, Changsha 410073, Peoples R China
Peking Univ, Coll Chem & Mol Engn, Beijing Natl Lab Mol Sci, Ctr Nanochem,Beijing Sci & Engn Ctr Nanocarbons, Beijing 100871, Peoples R China
Natl Univ Def Technol, Coll Adv Interdisciplinary Studies, Changsha 410073, Peoples R China
Hunan Univ, Coll Chem & Chem Engn, State Key Lab Chemo Biosensing & Chemometr, Inst Chem Biol & Nanomed ICBN, Changsha 410082, Peoples R China
Keywords CHEMICAL-VAPOR-DEPOSITION
GRAIN-BOUNDARIES
OPTICAL BASICITY
MOS2
HETEROSTRUCTURES
PRECURSOR
SCALE
Issue Date Jun-2021
Publisher NANOSCALE
Abstract Developing promoters that can boost the growth quality, efficiency, and robustness of two-dimensional (2D) transition metal dichalcogenides is significant for their industrial applications. Herein a new group (group IIA) of promoters in the periodic table has been disclosed, whose chlorides (especially CaCl2 and SrCl2) exhibit a versatile promoting effect on the CVD growth of various TMD monolayers, including hexagonal MoS2, MoSe2, Re doped MoS2, and triclinic ReS2. The promoting effect of group IIA promoters relies on the appropriate dose and is strongly substrate-dependent. The performances of five typical group IA-IIA metal chlorides are ranked by quantitative investigations, displaying periodic variations closely related to the electronegativities of the metal elements. A brand-new acid-base match model is proposed, attributing the promoting mechanism to an increase of the substrate basicity due to the usage of promoters, thus leading to the sufficient adsorption of the acidic precursor. Aberration-corrected annular dark field scanning transmission electron microscopy (ADF-STEM) was applied, unveiling anomalous grain boundaries (GBs) with a low density of coincident sites in the as-grown ReS2 and detailed atomic configurations of Re doped MoS2. This work expands the promoter library and gives an insight into GB engineering for the CVD growth of 2D TMDs.
URI http://hdl.handle.net/20.500.11897/619220
ISSN 2040-3364
DOI 10.1039/d1nr03273a
Indexed SCI(E)
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