Title Atomic-environment-dependent thickness of ferroelastic domain walls near dislocations
Authors Li, Mingqiang
Li, Xiaomei
Li, Yuehui
Liu, Heng-Jui
Chu, Ying-Hao
Gao, Peng
Affiliation Peking Univ, Sch Phys, Electron Microscopy Lab, Beijing 100871, Peoples R China
Peking Univ, Sch Phys, Int Ctr Quantum Mat, Beijing 100871, Peoples R China
Peking Univ, Acad Adv Interdisciplinary Studies, Beijing 100871, Peoples R China
Chinese Acad Sci, Beijing Natl Lab Condensed Matter Phys, Beijing 100190, Peoples R China
Chinese Acad Sci, Inst Phys, Beijing 100190, Peoples R China
Natl Chung Hsing Univ, Dept Mat Sci & Engn, Taichung 40227, Taiwan
Acad Sinica, Inst Phys, Taipei 11529, Taiwan
Collaborat Innovat Ctr Quantum Matter, Beijing 100871, Peoples R China
Keywords TRANSMISSION ELECTRON-MICROSCOPY
QUANTITATIVE MEASUREMENT
FERROELECTRIC PBTIO3
POLARIZATION
DISPLACEMENT
CONDUCTION
HREM
Issue Date 15-Apr-2020
Publisher ACTA MATERIALIA
Abstract Domain walls are of increasing interest in ferroelectrics because of their unique properties and potential applications in future nanoelectronics. However, the thickness of ferroelastic domain walls remains elusive due to the challenges in experimental characterization. Here, we determine the atomic structure of ferroelastic domain walls and precisely measure the polarization and domain wall thickness at picometer scale using annular bright field imaging from an aberration-corrected scanning transmission electron microscope. We find that the domain wall thickness in PbZr0.2Ti0.8O3 and PbTiO3 thin films is typically about one unit cell, across which the oxygen octahedron distortion behavior is in excellent agreement with previous first-principles calculations. Remarkably, wider domain walls about two unit cells in thickness are also observed for those domains walls are coupled with dislocations and underwent a compressive strain. These results suggest that the thickness of ferroelastic domain walls highly depends on their atomic environments. This study can help us to understand the past debatable experimental results and provide further insights into control of domain wall thickness via strain engineering for their possible applications in nanoelectronics. (C) 2020 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
URI http://hdl.handle.net/20.500.11897/588286
ISSN 1359-6454
DOI 10.1016/j.actamat.2020.02.032
Indexed SCI(E)
Scopus
EI
Appears in Collections: 物理学院
前沿交叉学科研究院

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