TitleIdentifying a doping type of semiconductor nanowires by photoassisted kelvin probe force microscopy as exemplified for GaN nanowires
AuthorsSun, Xiaoxiao
Wang, Xinqiang
Wang, Ping
Sheng, Bowen
Li, Mo
Su, Juan
Zhang, Jian
Liu, Fang
Rong, Xin
Xu, Fujun
Yang, Xuelin
Qin, Zhixin
Ge, Weikun
Shen, Bo
AffiliationPeking Univ, Sch Phys, State Key Lab Artificial Microstruct & Mesosccop, Beijing 100871, Peoples R China.
Collaborat Innovat Ctr Quantum Matter, Beijing 100871, Peoples R China.
Microsyst & Terahertz Res Ctr, 596,Yinhe Rd, Chengdu 610200, Peoples R China.
Peking Univ, Sch Phys, State Key Lab Artificial Microstruct & Mesosccop, Beijing 100871, Peoples R China.
Wang, XQ (reprint author), Collaborat Innovat Ctr Quantum Matter, Beijing 100871, Peoples R China.
KeywordsJUNCTION DIODE
Issue Date2017
PublisherOPTICAL MATERIALS EXPRESS
CitationOPTICAL MATERIALS EXPRESS.2017,7(3),904-912.
AbstractIt remains a challenge to characterize the doping type in nanowires (NWs). We report in this paper a novel way to probe the doping type in GaN NWs by photoassisted kelvin probe force microscopy (KPFM), as a proper example showing that this approach is straight forward, effective and practical. Through illumination with super-bandgap light, photo-generated electrons in the n-region are swept away from the surface due to the electric field in the space-charge region, thus the holes move to the surface; while in contrast, electrons in the p-region will move to the surface. The fact that the quasi-Fermi level moves upwards in n-type while downwards in p-type identifies the doping type of GaN NWs, and is clearly revealed by the contact potential difference detected by photoassisted KPFM. (C) 2017 Optical Society of America
URIhttp://hdl.handle.net/20.500.11897/474880
ISSN2159-3930
DOI10.1364/OME.7.000904
IndexedSCI(E)
Appears in Collections:物理学院

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