Title Direct Observations of Nanofilament Evolution in Switching Processes in HfO2-Based Resistive Random Access Memory by In Situ TEM Studies
Authors Li, Chao
Gao, Bin
Yao, Yuan
Guan, Xiangxiang
Shen, Xi
Wang, Yanguo
Huang, Peng
Liu, Lifeng
Liu, Xiaoyan
Li, Junjie
Gu, Changzhi
Kang, Jinfeng
Yu, Richeng
Affiliation Chinese Acad Sci, Inst Phys, Beijing Natl Lab Condensed Matter Phys, Beijing 100190, Peoples R China.
Peking Univ, Inst Microelect, Beijing 100871, Peoples R China.
Univ Chinese Acad Sci, Sch Phys Sci, Beijing 100049, Peoples R China.
Chinese Acad Sci, Inst Phys, Beijing Natl Lab Condensed Matter Phys, Beijing 100190, Peoples R China.
Kang, JF (reprint author), Peking Univ, Inst Microelect, Beijing 100871, Peoples R China.
Yu, RC (reprint author), Univ Chinese Acad Sci, Sch Phys Sci, Beijing 100049, Peoples R China.
Keywords ELECTROLYTE-BASED RERAM
CONDUCTIVE FILAMENTS
MEMRISTOR
RRAM
HOLOGRAPHY
OPERATIONS
RESISTANCE
CHANNELS
DEVICES
MODEL
Issue Date 2017
Publisher ADVANCED MATERIALS
Citation ADVANCED MATERIALS.2017,29(10).
Abstract Resistive switching processes in HfO2 are studied by electron holography and in situ energy-filtered imaging. The results show that oxygen vacancies are gradually generated in the oxide layer under ramped electrical bias, and finally form several conductive channels connecting the two electrodes. It also shows that the switching process occurs at the top interface of the hafnia layer.
URI http://hdl.handle.net/20.500.11897/474608
ISSN 0935-9648
DOI 10.1002/adma.201602976
Indexed SCI(E)
Appears in Collections: 信息科学技术学院

Files in This Work
There are no files associated with this item.

Web of Science®


0

Checked on Last Week

Scopus®



Checked on Current Time

百度学术™


0

Checked on Current Time

Google Scholar™





License: See PKU IR operational policies.