| Title | Fast and uniform growth of graphene glass using confined-flow chemical vapor deposition and its unique applications |
| Authors | Chen, Zhaolong Guan, Baolu Chen, Xu-dong Zeng, Qing Lin, Li Wang, Ruoyu Priydarshi, Manish Kr. Sun, Jingyu Zhang, Zhepeng Wei, Tongbo Li, Jinmin Zhang, Yanfeng Zhang, Yingying Liu, Zhongfan |
| Affiliation | Peking Univ, Coll Chem & Mol Engn, Beijing Sci & Engn Ctr Nanocarbons, Ctr Nanochem CNC, Beijing 100871, Peoples R China. Beijing Univ Technol, Minist Educ, Key Lab Optoelect Technol, Beijing 100124, Peoples R China. Chinese Acad Sci, Inst Semicond, State Key Lab Solid State Lighting, Beijing 100083, Peoples R China. Peking Univ, Dept Mat Sci & Engn, Coll Engn, Beijing 100871, Peoples R China. Tsinghua Univ, Dept Chem, Beijing 100084, Peoples R China. Tsinghua Univ, Ctr Nano & Micro Mech, Beijing 100084, Peoples R China. Peking Univ, Coll Chem & Mol Engn, Beijing Sci & Engn Ctr Nanocarbons, Ctr Nanochem CNC, Beijing 100871, Peoples R China. Zhang, YY (reprint author), Tsinghua Univ, Dept Chem, Beijing 100084, Peoples R China. Zhang, YY (reprint author), Tsinghua Univ, Ctr Nano & Micro Mech, Beijing 100084, Peoples R China. |
| Keywords | graphene glass confined-flow chemical vapor deposition transparent heating device epitaxial AlN film FEW-LAYER GRAPHENE HIGH-QUALITY LARGE-AREA EPITAXIAL GRAPHENE METAL-CATALYST BORON-NITRIDE SINGLE-LAYER FILMS TRANSPARENT SAPPHIRE |
| Issue Date | 2016 |
| Publisher | NANO RESEARCH |
| Citation | NANO RESEARCH.2016,9(10),3048-3055. |
| Abstract | Fast and uniform growth of high-quality graphene on conventional glass is of great importance for practical applications of graphene glass. We report herein a confined-flow chemical vapor deposition (CVD) approach for the high-efficiency fabrication of graphene glass. The key feature of our approach is the fabrication of a 2-4 mu m wide gap above the glass substrate, with plenty of stumbling blocks; this gap was found to significantly increase the collision probability of the carbon precursors and reactive fragments between one another and with the glass surface. As a result, the growth rate of graphene glass increased remarkably, together with an improvement in the growth quality and uniformity as compared to those in the conventional gas flow CVD technique. These high-quality graphene glasses exhibited an excellent defogging performance with much higher defogging speed and higher stability compared to those previously reported. The graphene sapphire glass was found to be an ideal substrate for growing uniform and ultra-smooth aluminum nitride thin films without the tedious pre-deposition of a buffer layer. The presented confined-flow CVD approach offers a simple and low-cost route for the mass production of graphene glass, which is believed to promote the practical applications of various graphene glasses. |
| URI | http://hdl.handle.net/20.500.11897/457499 |
| ISSN | 1998-0124 |
| DOI | 10.1007/s12274-016-1187-6 |
| Indexed | SCI(E) EI 中国科学引文数据库(CSCD) |
| Appears in Collections: | å å¦ä¸ å å å·¥ç¨ å¦é ¢ 工学院 |
