| Title | Co-design of ESD protection and LNA in RFIC |
| Authors | Hao, Yueguo Zhang, Qiao Bai, Xiaopeng Shi, Zitao Ma, Huainan Cheng, Yuhua |
| Affiliation | Shanghai Research Institute of Micro Electronics School of Information Science and Technology, Peking University, Beijing 100871, China |
| Issue Date | 2013 |
| Citation | 2013 IEEE 10th International Conference on ASIC, ASICON 2013.Shenzhen, China. |
| Abstract | This paper introduces a new FoM (figure of merit) to evaluate the overall performance of ESD and LNA and presents a design procedure of establishing a standard library of ESD protection cells to reduce the design time and complexity for RFIC designer. The electrostatic discharge protection cells have been designed in a 0.35??m BiCMOS process. The ESD robustness and RF characteristics will be verified when the RF chip is done. ? 2013 IEEE. |
| URI | http://hdl.handle.net/20.500.11897/410702 |
| DOI | 10.1109/ASICON.2013.6812038 |
| Indexed | EI |
| Appears in Collections: | 信息科学技术学院 |
