| Title | MTMO grayscale photomask |
| Authors | Guo, Chuan Fei Zhang, Jianming Miao, Junjie Fan, Yongtao Liu, Qian |
| Affiliation | Natl Ctr Nanosci & Technol, Beijing 100190, Peoples R China. Chinese Acad Sci, Grad Sch, Beijing 100080, Peoples R China. Beijing Univ, Acad Adv Interdisciplinary Studies, Beijing 100871, Peoples R China. Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China. Natl Ctr Nanosci & Technol, 11 Beiyitiao, Beijing 100190, Peoples R China. |
| Keywords | FILMS |
| Issue Date | 2010 |
| Publisher | 光学快报 |
| Citation | OPTICS EXPRESS.2010,18,(3),2621-2631. |
| Abstract | We present a new class of simple, cheap and stable grayscale photomasks based on the metal-transparent-metallic-oxides (MTMO) systems by laser direct writing in metal films. For obtaining high resolution and grainless grayscale patterns we developed a refinement method of the films, in which the nanometer size effect may play a significant role for the improvement. We propose a layered oxidation model and a grain model for the mechanism of In-and Sn-based MTMO systems. The masks have a wide application wavelength range at least from 350 to 700 nm. Three-dimensional microstructures have been successfully fabricated by using the MTMO grayscale masks. (C) 2010 Optical Society of America |
| URI | http://hdl.handle.net/20.500.11897/401310 |
| ISSN | 1094-4087 |
| DOI | 10.1364/OE.18.002621 |
| Indexed | SCI(E) |
| Appears in Collections: | 前沿交叉学科研究院 |
