| Title | Growth and stability of ultra-thin Pb films on Pb/Si(111)-��-��3 �� ��3 |
| Authors | Li, Wen-Juan Sun, Yu-Jie Zhu, Xie-Gang Wang, Guang Zhang, Yan-Feng Jia, Jin-Feng Ma, Xucun Chen, Xi Xue, Qi-Kun |
| Affiliation | Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China State Key Laboratory of Low-Dimensional Quantum Physics, Department of Physics, Tsinghua University, Beijing 100084, China Academy for Advanced Materials and Nanotechnology, College of Engineering, Peking University, Beijing 100871, China Department of Physics, Shanghai JiaoTong University, Shanghai 200240, China |
| Issue Date | 2011 |
| Publisher | surface review and letters |
| Citation | Surface Review and Letters.2011,18,(1-2),77-82. |
| Abstract | Ultra-thin Pb films with magic thicknesses of 2 monolayer (ML), 4 ML and 6 ML were prepared of atomically flat on the substrate of Si(111)-??-??3 ?? ??3 (or SIC phase) at 145 K. Their surface morphologies and stability were studied by low temperature scanning tunneling microscopy and temperature-dependent angle resolved photoemission spectroscopy. We found that the well ordered SIC interface can lower the diffusion barrier and enhance the interface charge transfer, leading to different critical thickness compared to Pb/Si(111)-7 ?? 7 grown under same conditions. Enhanced thermal expansion coefficients were also observed in ultra-thin Pb films at low temperature. ? 2011 World Scientific Publishing Company. |
| URI | http://hdl.handle.net/20.500.11897/395193 |
| ISSN | 0218625X |
| DOI | 10.1142/S0218625X11014473 |
| Indexed | SCI(E) EI |
| Appears in Collections: | 工学院 |
