Title Direct Observations of Retention Failure in Ferroelectric Memories
Authors Gao, Peng
Nelson, Christopher T.
Jokisaari, Jacob R.
Zhang, Yi
Baek, Seung-Hyub
Bark, Chung Wung
Wang, Enge
Liu, Yuanming
Li, Jiangyu
Eom, Chang-Beom
Pan, Xiaoqing
Affiliation Univ Michigan, Dept Mat Sci & Engn, Ann Arbor, MI 48109 USA.
Nanjing Univ, Natl Lab Solid State Microstruct, Nanjing 210093, Jiangsu, Peoples R China.
Nanjing Univ, Dept Mat Sci & Engn, Nanjing 210093, Jiangsu, Peoples R China.
Univ Wisconsin, Dept Mat Sci & Engn, Madison, WI 53706 USA.
Peking Univ, Int Ctr Quantum Mat, Beijing 100871, Peoples R China.
Peking Univ, Sch Phys, Beijing 100871, Peoples R China.
Univ Washington, Dept Mech Engn, Seattle, WA 98195 USA.
Keywords ferroelectrics
polarization switching
data retention failure
transmission electron microscopy
THIN-FILMS
POLARIZATION RETENTION
ELECTRODES
PHYSICS
HETEROSTRUCTURES
CAPACITORS
NANOSCALE
STABILITY
MECHANISM
DYNAMICS
Issue Date 2012
Publisher advanced materials
Citation ADVANCED MATERIALS.2012,24,(8),1106-1110.
Abstract Nonvolatile ferroelectric random-access memory uses ferroelectric thin films to save a polar state written by an electric field that is retained when the field is removed. After switching, the high energy of the domain walls separating regions of unlike polarization can drive backswiching resulting in a loss of switched domain volume, or in the case of very small domains, complete retention loss. Copyright ? 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
URI http://hdl.handle.net/20.500.11897/234551
ISSN 0935-9648
DOI 10.1002/adma.201103983
Indexed SCI(E)
EI
Appears in Collections: 量子材料科学中心
物理学院

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